2026 IP Diddimdol Program Follow-up Support for Outstanding Entrepreneurs (2nd Recruitment)
IP Diddimdol beneficiary entrepreneurs can receive follow-up support up to 20 million KRW annually for domestic filings, global PCT applications, and design development.
- Deadline
- Closed
This program provides follow-up support (domestic patent filing, PCT, brand/design development) to entrepreneurs who received IP Diddimdol rights realization support. Applications are accepted online from September 7 to September 8, 2026, at noon, with a mandatory 20% cash self-contribution.
3-second summary
- Target: Entrepreneurs supported by IP Diddimdol rights realization (within 2 years of initial benefit year)
- Recruitment Period: Sep 7, 2026 - Sep 8, 2026, 12:00
- Support Content: Domestic patent filing, PCT application, new brand/product/graphic/packaging design development
- Self-Contribution: Mandatory 20% cash contribution (regardless of education completion)
- Application Method: Online via KIPA Support System (https://www.ripc.org/pms)
Schedule & how to apply
- Deadline: 2026.09.08(Tue) 12:00
- Application Method: Online submission (https://www.ripc.org/pms)
Recommended for
- Recommended for entrepreneurs who started their business after basic counseling in the IP Diddimdol program and received rights realization support within the last two years.
Frequently asked questions
How do I apply?
Applications follow the official program notice, which is in Korean. See the source link for the method and receiving office; Beaconoi can prepare an English draft for your review.
Which organization runs this program?
This program is administered by Korea Invention Promotion Association / Regional Intellectual Property Center.
Last updated · Source: Korea Invention Promotion Association / Regional Intellectual Property Center — official notice
※ Program information is compiled from each institution’s public sources; actual eligibility, amounts and deadlines may change. Always verify against the official notice (in Korean) before applying.